Delta Mask uses the Heidelberg DWL 200 Laser Beam Pattern Generator for mask production.
This instrument works on a pixel basis, which makes it possible to produce chrome masks from all kinds of shapes which may occur in a layout.
Smallest linewidth : 1.5 micron (with 4mm write lens).
Address grid : 0.2 micron.
Laser : HeCd laser, wavelength 442 nm.
Environment : Class 1000 or better, 22 degr. C.